arfimmersion

由林育詩著作·2008—由於開發新光源的成本之高，.以水作為介質的浸潤式微影，不僅延長了.ArF光波源的...Thus,theimmersiontechniqueisbeingusedinmodernlithographyforthe65 ...,Immersionlithographyisatechniqueusedinsemiconductormanufacturingtoenhancetheresolutionandaccuracyofthelithographicprocess.,半導體先進製程發展擴大EUV市場需求，ASML可望持續受惠·登入裝置已達上限.,ArFIMMERSIONLIGHTSOURCES.ArFi:Extendin...

參考資訊如下
簡單的光學突破3C 科技瓶頸：浸潤式微影

由 林育詩 著作 · 2008 — 由於開發新光源的成本之高，. 以水作為介質的浸潤式微影，不僅延長了. ArF 光波源的 ... Thus, the immersion technique is being used in modern lithography for the 65 ...

Immersion lithography

Immersion lithography is a technique used in semiconductor manufacturing to enhance the resolution and accuracy of the lithographic process.

ArF Immersion

半導體先進製程發展擴大EUV 市場需求，ASML 可望持續受惠 · 登入裝置已達上限.

ArF IMMERSION LIGHT SOURCES

ArF IMMERSION LIGHT SOURCES. ArFi: Extending the Life of the 193 nm Wavelength. ArF (argon fluoride) immersion light sources feature a 193 nm wavelength for ...

Advances in Light Sources

2015年6月1日 — Most ArF immersion light sources have a target bandwidth of 300 fm E95 with a typical variation of 10–20%. This study used a bandwidth variation ...

A Study on the Resolution and Depth of Focus of ArF ...

由 J Song 著作 · 2022 · 被引用 1 次 — The ArF immersion system has a resolution of 42 nm critical dimension based on the line and space pattern, and can achieve a resolution of up to ...

Nikon Releases the NSR

2023年12月6日 — The NSR-S636E ArF immersion scanner utilizes an enhanced iAS*1 that performs sophisticated wafer multipoint measurement before exposure. This ...

Nikon Releases New NSR

2023年5月8日 — TOKYO - Nikon Corporation is pleased to announce the release of the NSR-S625E, an ArF immersion scanner optimized especially for middle ...

ArF Immersion Lithography Supports High-Volume 14

ArF Immersion Lithography Supports High-Volume 14-nm Chip Manufacturing · Improved CD control through high bandwidth stability · Gas management functions for ...